Table 2 The formulas of major scattering mechanisms used in 2DEG mobility calculations
From: The role of dislocation-induced scattering in electronic transport in GaxIn1-xN alloys
Scattering mechanism | Formula | Definition of variables |
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| K, electromagnetic coupling coefficient; JPE(k), electron wave vector dependent integral. | |
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| ρ, crystal density; v s , longitudinal acoustic phonon velocity; Ξ, deformation potential constant; m*, electron effective mass; JDP(k), electron wave vector dependent integral. b, Fang-Howard expression; qs, reciprocal screening length; f(0), occupation probability; F11(q), ground-state Fang-Howard wave function. | |
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| , polar optical phonon energy; and, high- and low-frequency dielectric constant; Z0, effective width of triangular well formed at the GaxIn1-xN/GaN interface and is given in terms of Fermi wave vector. | |
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| Δ, lateral size of the roughness; Λ, correlation length between fluctuations; JIFR(k), correlation length and the lateral size-dependent integral; n2D, 2D electron density. | |
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Alloy disorder[20] |
| x, Ga fraction; Ω0, the volume occupied by one atom; UA, alloy potential. |
| NDis, dislocation density per unit area which is taken as a fitting parameter; λD, Debye screening length; c, lattice constant of GaxIn1-xN. f, the fraction of filled traps that are assumed fully occupied. | |
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