Figure 1

Schematic diagram showing the processing for preparation of a bismuth nanowire for Hall measurements. (a) Polishing, (b) detection of the nanowire location, (c) removal of the side parts of the template, (d) exposure of the wire surface, (e) 3-D view of the exposed wire surface, (f) carbon deposition to form electrical contacts, and (g) contact between carbon film and copper electrodes located on the top of the quartz.