Figure 2From: Preparation of bismuth nanowire encased in quartz template for Hall measurements using focused ion beam processingSIM images during the FIB process. (a) Detection of the nanowire location, (b) removal of the side parts of the template, (c) side view tilted at 60ยบ to expose the nanowire surface, and (d) top view of the processed area after FIB processing. Inset of (d) shows optical microscope image of the processed area.Back to article page