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Table 3 Resonant frequencies of inductors integrated on PS and other substrates

From: RF performances of inductors integrated on localized p+-type porous silicon regions

Inductor characteristics

fr(GHz)

Inductor design

L (nH)

Glass

3-kΩ cm Si

20-mΩ cm Si

200-μm full PS sheet

100-μm full PS sheet

W10N55R30

5.3

15.8

15.3

15.6

15.3

-

W50N15R78

1.2

16.7

17

8.3

17

18.2

W50N35R30

3.5

6.5

6.4

4

6.5

7

W50N55R175

21

1.75

1.7

0.7

-

2.1

W10N55R80

10.2

10

9

2

10.5

-

W30N35R130

7

14.5

14

5.11

14.5

-

  1. Resonant frequencies (fr) of inductors integrated on PS and other substrates. Similar fr were obtained with full PS sheet, glass and high-resistivity silicon. fr is increased with the PS substrate with regard to highly doped silicon. fr, resonant frequency.

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