Figure 5From: Scanning X-ray nanodiffraction: from the experimental approach towards spatially resolved scattering simulationsInternal displacement field and simulated beam path within SiGe DMs. (a) depicts the x-component of the internal displacement field within SiGe DMs and the Si substrate. (b) shows the output of the weighting values w n for each scatterer n of the material in our model.Back to article page