Table 1 Compositional results (atomic percentages of oxygen (O) and silicon (Si))
From: Morphological, compositional, structural, and optical properties of Si-nc embedded in SiO x films
Temperature (°C) | dss (mm) | Atomic percentage | x = O/Si | |
|---|---|---|---|---|
O | Si | |||
1,400 | 2 | 30.76 | 69.22 | 0.44 |
1,300 | 3 | 61.60 | 38.38 | 1.60 |
1,150 | 4 | 56.02 | 43.96 | 1.27 |
1,050 | 5 | 64.48 | 35.50 | 1.81 |
900 | 6 | 62.49 | 37.50 | 1.66 |