Figure 4From: Passivation mechanism of thermal atomic layer-deposited Al2O3 films on silicon at different annealing temperaturesPlot of S eff and 1/ Q f 2with the linear fit for annealing temperatures. The annealing temperatures are between 400°C to 700°C (Qf> 6.8 × 1011cm-2). The slightly bent linear fit line was due to the logarithmic X- and Y-axes.Back to article page