Figure 2From: Modulation in current density of metal/n-SiC contact by inserting Al2O3 interfacial layerSchematic diagram of MIS structure and cross-sectional TEM of Al/Al 2 O 3 /SiC. (a) A schematic diagram of the MIS structure. (b) The cross-sectional TEM of the Al/Al2O3/SiC contact, showing that Al2O3 was deposited uniformly as a fully amorphous film.Back to article page