Figure 6From: Maskless and low-destructive nanofabrication on quartz by friction-induced selective etchingEffect of normal loads on the etching rates at different etching temperatures. Etching rates η of scanned area produced under various normal loads of 5, 8 and 12 μN at different etching temperatures. The corresponding contact pressure was 3.5, 4.4 and 4.7 GPa, respectively. Dashed line is Arrhenius fitting of the etching rates.Back to article page