Figure 8From: Maskless and low-destructive nanofabrication on quartz by friction-induced selective etchingComparison of etching results on monocrystalline quartz and amorphous SiO 2 . (a) No difference between covered surface and exposed surface on monocrystalline quartz after etching for 4 h at 293 K. (b) Exposed surface of amorphous SiO2 was etched evidently at 293 K.Back to article page