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Figure 5 | Nanoscale Research Letters

Figure 5

From: Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching

Figure 5

SEM images of plane-view SiNW arrays, cross-sectional SEM images of the SiNWs, and statistical distribution. (a) SEM images of plane-view SiNW arrays achieved with the catalysis of a 14-nm-thick Ag film annealed at 150°C for 10 min and cross-sectional SEM images of the SiNWs etched for (b) 5 min (nanowire length 0.5 μm), (c) 10 min (1 μm), and (d) 20 min (2 μm). All scale bars are 500 nm. (e) The statistical distribution for the average diameters of the corresponding SiNWs.

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