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Figure 4 | Nanoscale Research Letters

Figure 4

From: Grain size dependence of dielectric relaxation in cerium oxide as high-k layer

Figure 4

Capacitance-voltage (C-V) measurements of the as-deposited (AD) and the annealed (ann) samples under different frequencies. Frequencies: 100 Hz, 1 kHz, 10 kHz, 100 kHz, and 1 MHz. Remarkable frequency dispersions on C-V curves are observed for both the as-deposited (a) and the annealed samples (b). Compared to the as-deposited samples, the annealed samples show pronounced accumulation capacitance reduction. The most important effect of annealing is related to weakened accumulation capacitance and hence reduced k-value.

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