Table 1 Parameters in the standard Morse potential[14]
From: The evolution of machining-induced surface of single-crystal FCC copper via nanoindentation
C-Si | Parameter |
---|---|
D (eV) | 0.087 |
α (Å−1) | 5.14 |
r 0 (Å) | 2.05 |
From: The evolution of machining-induced surface of single-crystal FCC copper via nanoindentation
C-Si | Parameter |
---|---|
D (eV) | 0.087 |
α (Å−1) | 5.14 |
r 0 (Å) | 2.05 |