Figure 6From: Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etchingCross-sectional SEM images of SiNW arrays attached to silicon substrates. (a) 1-μm- and (b) 10-μm-long arrays. (c) A diagram of the calculation model of an opaque rectangular obstacle illuminated by a plane wave. (d) Integrated phase function at a wavelength of 1,050 nm for various length opaque rectangular obstacles.Back to article page