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Figure 1 | Nanoscale Research Letters

Figure 1

From: Fabrication of Ni-silicide/Si heterostructured nanowire arrays by glancing angle deposition and solid state reaction

Figure 1

Schematic illustration of the procedure for the fabrication of Ni-silicide/Si heterostructured nanowire arrays on Si(100) substrates. (a) Spread close packed monolayer PS spheres array on SiO2/Si(100) substrate, (b) O2 plasma etching, (c) Ar plasma etching, (d) Ag deposition, (e) metal-induced catalytic etching, (f) Ag, PS spheres and SiO2 removing, (g) glancing angle Ni deposition, (h) rapid thermal annealing treatment, and (i) Ni removing.

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