Table 1 Element content of the oxide nanofilms before and after annealing at 450°C and 550°C
From: p-Type hydrogen sensing with Al- and V-doped TiO2 nanostructures
Tested area | Oxide nanofilm condition | Element (at.%) | |||
---|---|---|---|---|---|
Ti | Al | V | O | ||
α-Phase region | After anodization | 61.45 | 6.52 | 2.68 | 29.35 |
Annealed at 450°C | 26.90 | 3.39 | 0.87 | 68.83 | |
Annealed at 550°C | 23.09 | 2.96 | 0.61 | 73.34 | |
β-Phase region | After anodization | 65.35 | 6.94 | 3.88 | 23.83 |
Annealed at 450°C | 44.40 | 4.79 | 2.15 | 48.66 | |
Annealed at 550°C | 32.76 | 3.60 | 1.50 | 62.15 |