Figure 4
From: Programmable nanoengineering templates for fabrication of three-dimensional nanophotonic structures
SEM image, optical reflectance, and photo/schematic of a-Si and cross-sectional | E | distribution of the electromagnetic (EM) wave. (a) The 60°-tilted-angle-view SEM image of amorphous Si (a-Si) nanocone arrays fabricated with plasma-enhanced chemical vapor deposition (PECVD), with the AAM template shown in the inset. (b) Optical reflectance of a-Si nanocone array and a-Si thin film, with the photographs of a-Si nanocone array (left photo) and a-Si thin film (right photo) on a transparent glass substrate shown in the inset. (c, d) Simulated cross-sectional |E| distribution of the EM wave on nanocone arrays and planar. (e, f) Photo and schematic of flexible a-Si nanocone array embedded in PDMS.