Figure 2From: Structural and optical characterization of pure Si-rich nitride thin filmsEvolution of the dispersion curves of SiN x thin films. The films were produced by the N2-reactive (full symbols) and the co-sputtering (empty symbols) methods as a function of the Ar/N2 gas flow ratio and the Si/Si3N4 target power ratio, respectively. The dispersion curve of Si3N4 from [28] is shown for comparison.Back to article page