Figure 2From: Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithographySEM and TEM images of the starting SiGe/Si MQW sample. (a) SEM image showing an 800-nm-diameter PS nanosphere monolayer coated on the SiGe/Si MQW sample. (b) Cross-sectional TEM image showing the 50-period SiGe/Si MQWs epitaxially grown on Si.Back to article page