Figure 3
From: Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography
SEM images of the SiGe/Si MQW samples etched by RIE for different durations. (a) 100 s, (b) 200 s, (c) 300 s and (d) 500 s, respectively.
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Figure 3 | Nanoscale Research Letters
