Figure 6From: Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer depositionHAADF-STEM and TEM images of the SiNW with Al 2 O 3 . (a) The procedure on how to measure the HAADF-STEM image. (b) Cross-sectional HAADF-STEM image of a SiNW cut into a round slice at the bottom of the SiNW array. (c) Cross-sectional TEM image of the interface between the SiNW and Al2O3.Back to article page