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Figure 1 | Nanoscale Research Letters

Figure 1

From: Focused ion beam processing to fabricate ohmic contact electrodes on a bismuth nanowire for Hall measurements

Figure 1

Experimental procedure for the fabrication of electrodes and evaluation of bismuth nano- and microwires. (a) Configuration for Hall measurements of a bismuth nanowire. (b) Procedure for the fabrication and evaluation of electrodes on a 521-nm-diameter bismuth nanowire. The two-wire resistance was measured before FIB processing, and the I-V relationship and two- and four-wire resistance were measured after FIB processing. (c) Procedure for the fabrication of electrodes for Hall measurements.

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