Figure 2From: Focused ion beam processing to fabricate ohmic contact electrodes on a bismuth nanowire for Hall measurementsSchematic diagrams for FIB processing to fabricate Hall measurement electrodes on a 521-nm-diameter bismuth nanowire. (a) Overall view of the fabricated sample. (b-g) Procedure for the fabrication of electrodes by FIB. (h-k) Cross-sectional view during electrode fabrication. (l) 3-D view of processing with the dual-beam FIB-SEM.Back to article page