Figure 5
From: The fabrication of large-scale sub-10-nm core-shell silicon nanowire arrays
SEM images of samples after dry oxidation. (a) to (f) SEM images of samples after first-step oxidation of (a) 20, (b) 30, and (c) 40 min, and two-step oxidation of (d) 30 + 20 min, (e) 30 + 30 min, and (f) 30 + 40 min. (g) SEM image for the sample with reduced diameter of around 50 nm only by one-step oxidation. (h) The silicon diameter and oxidation time relationship for samples with typical initial diameters.