Figure 4From: Sub-100-nm ordered silicon hole arrays by metal-assisted chemical etchingAg nanodot arrays formed on Si substrate. (a) SEM image of Ag nanodot arrays formed on Si substrate through anodic porous alumina mask. (b) AFM tapping mode image. Metal deposition was conducted in a solution of 2 × 10-3 mol dm-3 AgNO3 and 5 mol dm-3 HF for 15 s.Back to article page