Figure 6From: Sub-100-nm ordered silicon hole arrays by metal-assisted chemical etchingSEM images of Si nanohole arrays fabricated by Au-assisted chemical etching. (a) SEM image of Au nanodot arrays formed on Si substrate through anodic porous alumina mask. (b) Top and (c) cross-sectional SEM images of Si nanohole arrays fabricated by Au-assisted chemical etching in 5 mol dm-3 HF - 1 mol dm-3 H2O2 solution for 1 min.Back to article page