Figure 1
STM images of the Si(110) surface and the manganese silicide NWs grown on it. (a) STM images (500 × 500 nm2) of a clean Si(110) surface. The inset is a high-resolution STM image (30 × 30 nm2) showing the 16 × 2 reconstruction of the surface. A 16 × 2 unit cell is outlined by a rectangle. (b) STM image (1,600 × 1,600 nm2) of manganese silicide NWs and islands grown by depositing 1 ML Mn on the Si(110) surface at 585°C. During deposition, the deposition rate was kept at approximately 0.02 ML/min.