Figure 4
STM images showing the influence of Mn deposition rate on the growth of NWs. Series of STM images (1,000 × 1,000 nm2) of the manganese silicide NWs and islands grown on the Si(110) surfaces at various depositing rates. (a) Approximately 0.02, (b) 0.05, (c) 0.2, and (d) 0.5 ML/min. The growth temperature and the Mn coverage were kept at 550°C and 1 ML, respectively.