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Table 1 Average dimensions and number density of the NWs and 3D islands grown at different deposition rates

From: Self-assembled growth of MnSi~1.7 nanowires with a single orientation and a large aspect ratio on Si(110) surfaces

Deposition rate (ML/min)

Length of NWs (nm)

Width of NWs (nm)

Height of NWs (nm)

Density of NWs (number/μm2)

Size of 3D islands (nm)

Height of 3D islands (nm)

Density of 3D islands (number/μm2)

0.5

126.3

13.3

2.2

42

17.0

4.1

98

0.2

208.9

14.3

2.4

26

19.9

4.9

56

0.05

347.9

16.1

3.0

15

29.8

6.9

20

0.02

519.0

16.9

5.0

9

46.4

8.9

12

  1. The growth temperature and Mn coverage for each deposition were kept at 550°C and 1 ML, respectively.

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