Self-assembled growth of MnSi~1.7 nanowires with a single orientation and a large aspect ratio on Si(110) surfaces

Table 2 Average dimensions and number density of the NWs and 3D islands grown at different deposition times

Deposition time (min)	Length of NWs (nm)	Width of NWs (nm)	Height of NWs (nm)	Density of NWs (number/μm²)	Size of 3D islands (nm)	Height of 3D islands (nm)	Density of 3D islands (number/μm²)
5	176.3	18.9	2.9	31	18.0	5.2	49
10	271.5	17.2	3.5	21	24.7	7.2	46
25	281.2	16.9	4.2	25	27.0	7.3	65
50	261.4	16.5	5.1	20	35.9	10.3	70

The growth temperature and deposition rate for each deposition were kept at 550°C and 0.2 ML/min, respectively.