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Table 1 A summary of samples and molar ratios per 100 mol of water

From: Ordered mesoporous silica prepared by quiescent interfacial growth method - effects of reaction chemistry

Sample Acid Surfactant Silica source
  HA NA SA CTAB T20 T80 TBOS TEOS
MSF 3.34    0.026    0.05  
MS-7   0.20 to 3.34   0.026    0.05  
MS-12    1.00 to 3.34 0.026    0.05  
MS-4 3.34    0.026     0.08
MS-6b   3.41   0.026     0.08
MS-5a 3.34     0.01    0.05
MS-5b 3.34      0.01   0.05
  1. All preparations took place at room temperature and quiescent (no-mixing) conditions. HA, hydrochloric acid (HCl); NA, nitric acid (HNO3); SA, sulfuric acid (H2SO4); T20, Tween 20; T80, Tween 80.