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Table 1 A summary of samples and molar ratios per 100 mol of water

From: Ordered mesoporous silica prepared by quiescent interfacial growth method - effects of reaction chemistry

Sample	Acid			Surfactant			Silica source
	HA	NA	SA	CTAB	T20	T80	TBOS	TEOS
MSF	3.34			0.026			0.05
MS-7		0.20 to 3.34		0.026			0.05
MS-12			1.00 to 3.34	0.026			0.05
MS-4	3.34			0.026				0.08
MS-6b		3.41		0.026				0.08
MS-5a	3.34				0.01			0.05
MS-5b	3.34					0.01		0.05

All preparations took place at room temperature and quiescent (no-mixing) conditions. HA, hydrochloric acid (HCl); NA, nitric acid (HNO₃); SA, sulfuric acid (H₂SO₄); T20, Tween 20; T80, Tween 80.

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