Skip to main content
Figure 1 | Nanoscale Research Letters

Figure 1

From: Influence of hole shape/size on the growth of site-selective quantum dots

Figure 1

Top and profile images of dry etched-holes. SEM images of holes after dry etching with resist remaining on the surface. Regularly shaped circular holes are observed in the top view (a) while the profile in (b) shows the vertical sidewalls. The resist is affected near the holes and pushed back. Therefore, the holes increase with etching time in lateral dimension.

Back to article page