Figure 2From: Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scaleSEM images of the nanoimprinted samples after RIE. Inset shows the respective cross-sections. (a) 300-nm period hexagonal array of 180-nm (facet-to-facet) hexagonal pillars/studs, (b) 300-nm period square array of 200-nm × 100-nm rectangular pillars, and (c) 150-nm period hexagonal array of 50-nm diameter circular studs.Back to article page