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Table 1 The fitted parameters of the TM-doped TiO 2 films determined by the SE spectra

From: Influence of transition metal doping on the structural, optical, and magnetic properties of TiO2 films deposited on Si substrates by a sol–gel process

 

Г(eV)

EOBG(eV)

ϵ

A0(eV3/2)

df (nm)

ds (nm)

CTM(%)

Undoped

0.02 ± 0.01

3.58 ± 0.01

0.11 ± 0.03

136.6 ± 10

355 ± 10

5 ± 2

 

Dopant content

       

  Fe

0.01

0.030 ± 0.01

3.56 ± 0.02

0.260 ± 0.02

132.31 ± 12

288 ± 8

3 ± 1

0.8

0.03

0.085 ± 0.06

3.54 ± 0.02

0.087 ± 0.02

126.23 ± 20

265 ± 6

4 ± 2

2.7

  Ni

0.01

0.035 ± 0.02

3.53 ± 0.01

0.1 ± 0.04

134.48 ± 13

233 ± 7

3 ± 1

0.9

0.03

0.036 ± 0.03

3.50 ± 0.01

0.517 ± 0.11

128.18 ± 14

219 ± 6

3 ± 1

2.9

  Co

0.01

0.042 ± 0.01

3.48 ± 0.02

0.528 ± 0.10

125.11 ± 11

215 ± 5

3 ± 2

0.8

0.03

0.106 ± 0.04

3.43 ± 0.01

0.353 ± 0.15

118.9 ± 6

206 ± 5

4 ± 2

2.8

  1. The film thickness (df), the thicknesses of the surface rough layer (ds), and the parameter value of Adachi's model (A0) for TM-doped TiO2 films with dopant content extracted from the simulation of SE in Figure 7. The 90% reliability of the fitted parameters is shown with ± sign. The TM atom composition CTM derived by the XPS spectra is also listed.

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