Table 1 L , R avg , and AER of the SiNWs fabricated with different etching times
t(min) | L(μm) | Ravg(%) | AER |
---|---|---|---|
0 | 0 | 35.79 | 1 |
2 | 1 | 8.14 | 9.06 |
5 | 2.5 | 5.98 | 21.15 |
10 | 5 | 3.62 | 40.31 |
20 | 10 | 2.97 | 81.62 |
t(min) | L(μm) | Ravg(%) | AER |
---|---|---|---|
0 | 0 | 35.79 | 1 |
2 | 1 | 8.14 | 9.06 |
5 | 2.5 | 5.98 | 21.15 |
10 | 5 | 3.62 | 40.31 |
20 | 10 | 2.97 | 81.62 |