t(min)
|
L(μm)
|
Ravg(%)
|
AER
|
---|
0
|
0
|
35.79
|
1
|
2
|
1
|
8.14
|
9.06
|
5
|
2.5
|
5.98
|
21.15
|
10
|
5
|
3.62
|
40.31
|
20
|
10
|
2.97
|
81.62
|
- t, L, Ravg, and AER are etching time, the length of the SiNWs, the average reflectivity (350 to 1,000 nm), and the surface area enhancement ratio, respectively.