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Figure 1 | Nanoscale Research Letters

Figure 1

From: Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask

Figure 1

Examples of SEM images of a PAA film on Si. The specific PAA film on Si was fabricated by anodic oxidation of an Al film/Si in oxalic acid aqueous solution, using two-step anodization. Images (a) and (b), and the inset of (b) are top view images, while (c) depicts a cross-sectional image. The pore diameter in this sample is approximately 40 nm after pore widening for a duration of 40 min.

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