Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina mask

Table 1 Characteristics of the PAA layers in the three different samples used in this work

	PAA thickness (nm)	Pore size in nm after pore widening for 40 min	Annealing
Sample 1	390	35 – 45	No
Sample 2	560	35 – 55	Yes
Sample 3	400	35 – 45	Yes