Figure 6From: Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithographyAFM topography, KPFM scan, and comparison of height and CPD value profiles. AFM topography (a) and KPFM scan (b) of a pattern made in both polarizations: oxide (left) and graphitic (right) body contours are clearly resolved by CPD difference. Comparison of height profile and CPD value profile (five-point average along the black line) (c).Back to article page