Figure 2From: Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applicationsSEM images of ALD Pt on the Al 2 O 3 surface corresponding to different substrate temperatures. (a) 300°C, (b) 325°C, and (c) 350°C.Back to article page