Figure 3From: Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applicationsSurvey XPS spectra of ALD Pt on Al 2 O 3 film as a function of (MeCp)Pt(Me) 3 pulse time. Substrate temperature 300°C, deposition cycles 70.Back to article page