Figure 5From: Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applicationsSEM images of ALD Pt on Al 2 O 3 as a function of deposition cycles. (a) 40, (b) 60, (c) 70, and (d) 90 cycles. Substrate temperature, 300°C; pulse time of (MeCp)Pt(Me)3, 1 s.Back to article page