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Figure 5 | Nanoscale Research Letters

Figure 5

From: Optimum deposition conditions of ultrasmooth silver nanolayers

Figure 5

AFM image and profiles. (a) AFM image of 10-nm-thick Ag film deposited at 295 K. The lowest ever reported morphology parameters for e-beam deposition technique are as follows: ten-point height value = 1.05 nm, average height = 0.9 nm, and RMS height = 0.22 nm. AFM profiles of (b) 10- and (c) 30-nm-thick Ag films deposited at 295 K.

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