Figure 2From: Electron beam lithography with feedback using in situ self-developed resistSEM and AFM images of structures in nitrocellulose. (a) SEM image of line array exposed in nitrocellulose without ex situ development, showing a line width of 15 nm. (b) AFM image and cross-section of complex microstructure exposed in nitrocellulose after ex situ solvent development.Back to article page