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Figure 3 | Nanoscale Research Letters

Figure 3

From: Electron beam lithography with feedback using in situ self-developed resist

Figure 3

CAD pattern design and structures exposed in nitrocellulose. (a) The CAD pattern design consisting of five identical wheel array structures (see right side for zoom-in view) at the 1 mm × 1 mm writing field center and four corners. One wheel structure exposed in nitrocellulose at the center (b) and corner (c) without beam optimization by defocus. One wheel structure at the center (d) and corner (e) with beam optimization by defocusing at 37 μm.

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