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Table 1 WVTRs with mean deviation of several AlO x /PP multilayers and single AlO x films, measured at 60℃ and 90% RH

From: Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Barrier WVTR [gm−2d−1]
Glass lid (6 ± 2) × 10 −4
3.5 dyads (1.2 ± 0.7) × 10 −3
2.5 dyads (2 ± 0.9) × 10 −3
1.5 dyads (3.6 ± 1.3) × 10 −3
50-nm PEALD aluminium oxide (400 W, 10 s) (4.4 ± 0.8) × 10 −3
50-nm PEALD aluminium oxide (100 W, 1 s) (8.5 ± 2.4) × 10 −3
50-nm TALD aluminium oxide (7.7 ±2.3) × 10 −3