Account

Table 2 WVTRs with mean deviation of TALD aluminium oxide films with layer thicknesses from 25 to 100 nm, measured at 60â„ƒ and 90% RH

From: Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Thickness [nm]	WVTR [gm⁻²d⁻¹]
25	(8.5 ± 2.2) × 10 ⁻²
50	(7.7 ± 2.3) × 10 ⁻³
100	(6.4 ±1.2) × 10 ⁻³

Back to article page