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Table 2 WVTRs with mean deviation of TALD aluminium oxide films with layer thicknesses from 25 to 100 nm, measured at 60℃ and 90% RH

From: Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Thickness [nm] WVTR [gm−2d−1]
25 (8.5 ± 2.2) × 10 −2
50 (7.7 ± 2.3) × 10 −3
100 (6.4 ±1.2) × 10 −3