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Table 3 Carbon content and refractive index at 633 nm of aluminium oxide films at different process conditions, deposited at 80℃

From: Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

Plasma power [W] Plasma pulse time [s] C [wt.%] n
400 10 3.1 1.62
400 1 6 1.60
100 10 4.6 1.61
100 1 7 1.60
Thermally grown 4.6 1.60