Figure 1
From: Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si3N4 mask
Schematic illustration showing the fabrication process. (a) Scratching a spherical diamond tip along the designed traces on the silicon sample coated with Si3N4 mask (Si/Si3N4). (b) Selective etching of the scratched Si3N4 mask in HF solution. (c) Selective etching of the exposed silicon in KOH solution. (d) Removing the residual Si3N4 mask by HF solution.