Figure 1From: Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si3N4 maskSchematic illustration showing the fabrication process. (a) Scratching a spherical diamond tip along the designed traces on the silicon sample coated with Si3N4 mask (Si/Si3N4). (b) Selective etching of the scratched Si3N4 mask in HF solution. (c) Selective etching of the exposed silicon in KOH solution. (d) Removing the residual Si3N4 mask by HF solution.Back to article page