Figure 1
From: Crossbar nanoarchitectonics of the crosslinked self-assembled monolayer
Scheme process flow for fabrication of crossbar molecular devices. (a) Photoresist patterning for bottom contacts on SiO2. (b) The 100-nm bar patterns were created using electron beam lithography. (c) Deposition of 10 nm of Ti and 150-nm Au over patterned substrate and lift-off excess Au with photoresist removal. (d) Deposition of SAM over the entire substrate. (e) Preparation and deposition of top electrodes.