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Table 2 Thickness evolution of the thin films obtained by ISS process after thermal treatment

From: A comparative study of two different approaches for the incorporation of silver nanoparticles into layer-by-layer films

Fabrication process

Temperature

Thickness (nm)

LSPR (λmax; Amax)

[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycle

Ambient

294 ± 8

424.6 nm; 1.07

[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles

50°C

277 ± 9

424.6 nm; 1.10

[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles

100°C

256 ± 7

424.6 nm; 1.16

[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles

150°C

212 ± 7

436.8 nm; 1.63

[PAH(9.0)/PAA(9.0)]40+ 4 L/R cycles

200°C

194 ± 7

477.1 nm; 1.57

  1. Thickness evolution of the ISS thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax) as a function of the temperature.

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